Integrated
Measurement Association
October 11, 2001
Banff, Alberta Canada
Meeting Agenda
Progress on SEMI North American Integrated Metrology
Task Force Efforts for Communication Standard(s)
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Definition
of Process Parameters Needed for MBPC:
Report from SEMI Equipment Control Systems Task Force
click here
Preliminary
Report on the Effects of Metrology Time Delay on
Run-to-Run Control
click here
Accelerating
Yield
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Integration
issues with IM 200mm to 300mm transition
Case study: Standard integration on 300mm CMP tool
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Integrated
Measurements for 200mm Process Tools
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Integration
Effectiveness of In Situ Optical
Metrology for CMP
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Use
of FabGuard for Tool Monitoring
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Sensor
Integration & Data collection Project
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Concepts
of Plasma Data Analysis and Equipment Coupling
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Supplier
Perspectives
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